3.1 Principle of TN-Type LCDs
3.2 Transmission of TN Cell as Function
of the Applied rms Voltage
3.3 Schematics of a Thin-Film
Transistor
3.4 Characteristics of a-Si TFTs
3.5 Cross Sections of a-Si TFTs
3.6 Cross Section of Low-Temperature p-
Si TFT
3.7 Characteristics of Low-Temperature
p-Si TFTs
3.8 Cross-Sectional View of TFT LCD
3.9 Current Voltage Characteristics of
SiNx and Ta2O5 MIMs
3.10 Circuit Diagram of a Pixel and the
MIM Structure in a MIM Diode Display
3.11 Current Voltage Characteristic of
20 şm pin Diode
3.12 Diode Ring (a) and Back-to-Back
Diode (b) Configurations
3.13 Two-Diode Switch Configuration
Operated in the Alternate Scan Mode
3.14 Cross Section of pin Diode
Display
3.15 Configuration of the FSU LCD
Industry
3.16 Photoresist Coater (Platan)
3.17 The Minsk MIM Display
Topology
3.18 Multifunction Active-Matrix
Liquid-Crystal Display MFI
3.19 Platan Filter Dyes
4.1 Field Emission Display Cross
Section
4.2 Polycrystalline Diamond Particles on
Silicon Tips
4.3 Single Crystal Diamond Particle on
Silicon Tip
4.4 Continuous Coating of Silicon Tip
with Diamond Particles
4.5 Field Emission (Fowler-Nordheim)
Plots for Diamond-Coated Silicon Tips
4.6 Sample of a Field Emission Display
(Zelenograd)
4.7 FED Design at Krasnoyarsk
4.8 Cross Section Diagram of the EBSL
Tube #1
4.9 Cross Section Diagram of the EBSL
Tube #2
6.1 Flow of Resources and Decision Making in the Planned Economy of the FSU
7.1 Budgets of an FSU Institute